Title :
Practical Anti-Microbial Surfaces on Nylon and Polyester by UV Photochemistry
Author :
Kelley, Michael J. ; Zhu, Zhengmao
Author_Institution :
Jefferson Lab & Coll. of William & Mary, Newport News
Abstract :
Surface radicals generated by 193 nm (nylon) or 172 nm (PET) UV light afford strongly antimicrobial amine functionality by grafting or by transformation. They are broadly effective in the lab and significantly viable in the field.
Keywords :
free radicals; microorganisms; molecular biophysics; photochemistry; polymers; UV light; UV photochemistry; anti-microbial surfaces; antimicrobial amine functionality; grafting; nylon; polyester; surface radicals; wavelength 172 nm; wavelength 193 nm; Chemistry; Costs; Educational institutions; Influenza; Lead; Microwave integrated circuits; Nitrogen; Photochemistry; Polymers; Positron emission tomography;
Conference_Titel :
Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-834-6
DOI :
10.1109/CLEO.2007.4453755
