Title :
Passivated boron emitters for n-type buried contact solar cells
Author :
Slade, Alexander M. ; Honsberg, Christiana B. ; Wenham, Stuart R.
Author_Institution :
Centre for Photovoltaic Eng., New South Wales Univ., Sydney, NSW, Australia
Abstract :
The emitter saturation current, Joe, was measured for boron diffused emitters of sheet resistivities ranging from 10 to 4000 Ω/□. Boron tribromide was the diffusion source. The saturation current was measured for SiO2 passivation. It was found that a forming gas anneal was essential for light diffusions to have a low saturation current. Values for Joe varied from 1.5-300 fA/cm2. The results of the emitter saturation current measurements for boron diffusions are used to model double sided floating junction solar cells that would be made from n-type Cz wafers with a boron diffused emitter
Keywords :
boron; diffusion; elemental semiconductors; passivation; semiconductor doping; silicon; solar cells; Si:B; SiO2 passivation; boron diffused emitter; boron diffusions; boron tribromide; diffusion source; double sided floating junction solar cells; emitter saturation current; forming gas anneal; light diffusions; low saturation current; n-type Cz wafers; n-type buried contact solar cells; passivated boron emitters; saturation current; sheet resistivities; Australia; Boron; Conductivity; Current measurement; Degradation; Passivation; Photovoltaic cells; Photovoltaic systems; Solar power generation; Solids;
Conference_Titel :
Photovoltaic Specialists Conference, 2000. Conference Record of the Twenty-Eighth IEEE
Conference_Location :
Anchorage, AK
Print_ISBN :
0-7803-5772-8
DOI :
10.1109/PVSC.2000.915809