DocumentCode
3027910
Title
Large-scale atomistic simulations of nanoindentation and crack propagation under compression
Author
Kalia, Rajiv K. ; Nakano, Aiichiro ; Szlufarska, Izabela ; Vashishta, Priya
Author_Institution
Univ. of Southern California, Los Angeles, CA, USA
fYear
2004
fDate
7-11 June 2004
Firstpage
17
Lastpage
19
Abstract
Large-scale molecular dynamics (MD) simulations have been performed on parallel computers to study nanoindentation-induced amorphization in silicon carbide crystal. The load-displacement response exhibits an elastic shoulder followed by a plastic regime consisting of a series of load drops. Analyses of bond angles, local pressure and shear stress, and shortest-path rings show that these load drops are related to dislocation activities under the indenter. We have found that amorphization is driven by the coalescence of dislocation loops and that there is a strong correlation between load-displacement response and ring distribution. Current efforts focus on large-scale MD simulations of (a) nanoindentation in amorphous and nanophase SiC and (b) crack propagation in amorphous and nanostructured SiO/sub 2/ under compression.
Keywords
amorphisation; cracks; dislocation loops; elasticity; indentation; molecular dynamics method; physics computing; plasticity; silicon compounds; solid-state phase transformations; stress analysis; amorphization; crack propagation; dislocation loop; large-scale atomistic simulation; large-scale molecular dynamic simulation; load-displacement; nanoindentation; parallel computer; ring distribution; silicon carbide crystal; Amorphous materials; Computational modeling; Computer simulation; Concurrent computing; Crystalline materials; Crystallization; Large-scale systems; Physics computing; Plastics; Silicon carbide;
fLanguage
English
Publisher
ieee
Conference_Titel
Users Group Conference (DOD_UGC'04), 2004
Conference_Location
Williamsburg, VA, USA
Print_ISBN
0-7695-2259-9
Type
conf
DOI
10.1109/DOD_UGC.2004.25
Filename
1420846
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