Title :
A new approach for forming device contacts with improved surface passivation [solar cells]
Author :
Koschier, Linda M. ; Wenham, Stuart R.
Author_Institution :
Centre for Photovoltaic Eng., New South Wales Univ., Sydney, NSW, Australia
Abstract :
Increased interest in renewable energy sources and concern for the environment are giving impetus to the search for viable energy alternatives. One step to increasing the economic viability of PV technology is to improve the energy conversion efficiency. Most commercially produced solar cells suffer from poor rear surface passivation, including the buried contact solar cell (BCSC), with a poor back surface field (BSF) produced by an aluminium alloying process. In this work, the low temperature process of metal mediated epitaxial growth (MMEG) is used to produce an improved back surface field (BSF) and surface passivation for the BCSC in conjunction with reduced area contacts. The material produced by MMEG gives a p+ epitaxial silicon layer doped with Al at approximately 2×1018 atoms-cm-3. Experimental devices achieve an improvement of 30-40 mV in open circuit voltage over the standard BCSC indicating a significant improvement in rear surface passivation
Keywords :
aluminium; elemental semiconductors; epitaxial growth; passivation; semiconductor device measurement; semiconductor device testing; semiconductor doping; semiconductor growth; semiconductor-metal boundaries; silicon; solar cells; Al doping; PV technology; Si:Al; buried contact solar cell; energy alternatives; energy conversion efficiency; epitaxial silicon layer; metal mediated epitaxial growth; open circuit voltage; poor back surface field; rear surface passivation; reduced area contacts; renewable energy sources; solar cell contacts formation; surface passivation improvement; Alloying; Aluminum; Energy conversion; Environmental economics; Epitaxial growth; Passivation; Photovoltaic cells; Power generation economics; Renewable energy resources; Temperature;
Conference_Titel :
Photovoltaic Specialists Conference, 2000. Conference Record of the Twenty-Eighth IEEE
Conference_Location :
Anchorage, AK
Print_ISBN :
0-7803-5772-8
DOI :
10.1109/PVSC.2000.915853