Title :
Effects of buffer layers on SSI CIGSS-absorber transient I-V and C-V behavior
Author :
Johnson, P. ; Sites, J. ; Ramanathan, K. ; Olsen, L. ; Tarrant, D.
Author_Institution :
Dept. of Phys., Colorado State Univ., Fort Collins, CO, USA
Abstract :
Many thin-film CIS photovoltaic devices exhibit a modest level of reversible transient behavior in electrical properties. This paper evaluates this behavior by comparing three cell configurations processed differently. The configurations include CIGSS cells made by Siemens Solar Industries (SSI), SSI absorbers plus buffers/windows done elsewhere, and standard NREL CIGS cells. The buffers used include combinations of the following: KCN solution etching treatment, annealing of the samples after CdS deposition, and/or chemical vapor deposition of ZnO without CdS deposition. All cells made with SSI absorbers showed transient behavior in fill factor, while the NREL cells did not. Post-annealing of devices was found to improve baseline performance and reduce transient behavior
Keywords :
CVD coatings; II-VI semiconductors; annealing; cadmium compounds; copper compounds; etching; gallium compounds; indium compounds; solar cells; ternary semiconductors; transient analysis; zinc compounds; CIGSS-absorber transient C-V behavior; CIGSS-absorber transient I-V behavior; CdS; CdS deposition; Cu(InGa)(SSe)2; KCN; KCN solution etching treatment; NREL CIGS cells; Siemens Solar Industries; ZnO; ZnO without CdS deposition; annealing; buffer layers; buffers/windows; chemical vapor deposition; electrical properties; fill factor; post-annealing; reversible transient behavior; thin-film CIS photovoltaic devices; transient behavior; Annealing; Buffer layers; Capacitance-voltage characteristics; Chemical vapor deposition; Computational Intelligence Society; Etching; Photovoltaic systems; Solar power generation; Thin film devices; Voltage;
Conference_Titel :
Photovoltaic Specialists Conference, 2000. Conference Record of the Twenty-Eighth IEEE
Conference_Location :
Anchorage, AK
Print_ISBN :
0-7803-5772-8
DOI :
10.1109/PVSC.2000.915918