Title :
High-speed InGaAs-based vertical Schottky barrier photodetectors
Author :
Wohlmuth, W. ; Seo, J.-W. ; Pay, P. ; Caneau, C. ; Adesida, I.
Author_Institution :
Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL, USA
Abstract :
In this work, we report on the design, fabrication, and characterization of an InGaAs-based vertical Schottky barrier (VSB) photodetector that uses a lattice-matched n--InAlAs Schottky barrier height enhancement layer in conjunction with a 320 nm-thick film of ITO to form a high quality transparent Schottky contact. The Schottky barrier height of ITO on n--InAlAs was determined to be 0.68 eV through the use of Norde plots and I-V measurements. The thin film of ITO and the device passivation layer of silicon nitride, together, form an odd-multiple quarter-wave transformer to 1.31 μm perpendicularly incident light. The devices exhibited very low dark current densities, high responsivities, and high 3-dB bandwidths. A dark current per unit area of 8.87 ·10-5 A/cm-2 at an applied bias of 5 V was obtained. The responsivity for all the devices tested ranged from 0.55 to 0.59 A/W at a wavelength of 1.31 μm. The 15 μm diameter devices exhibited 3-dB bandwidths of 19 and 25 GHz in response to 1.55 μm illumination with an applied bias of 5 and 10 V, respectively
Keywords :
III-V semiconductors; Schottky barriers; gallium arsenide; high-speed optical techniques; indium compounds; photodetectors; 1.31 micron; 1.55 micron; 10 V; 19 GHz; 25 GHz; 5 V; I-V measurement; ITO thin film; InGaAs-ITO; InGaAs-InSnO; Norde plot; bandwidth; dark current density; high-speed vertical Schottky barrier photodetector; lattice-matched n--InAlAs Schottky barrier height enhancement layer; quarter-wave transformer; responsivity; silicon nitride passivation layer; transparent Schottky contact; Bandwidth; Dark current; Fabrication; Indium tin oxide; Passivation; Photodetectors; Schottky barriers; Semiconductor thin films; Silicon; Thin film devices;
Conference_Titel :
Indium Phosphide and Related Materials, 1997., International Conference on
Conference_Location :
Cape Cod, MA
Print_ISBN :
0-7803-3898-7
DOI :
10.1109/ICIPRM.1997.600202