• DocumentCode
    3030330
  • Title

    Structuring of grating arrays in multilayered foil by excimer laser

  • Author

    Leech, Patrick W. ; McCarthy, Lawry ; Osvath, Peter

  • Author_Institution
    CSIRO CSME, Clayton, VIC
  • fYear
    2008
  • fDate
    25-29 Feb. 2008
  • Firstpage
    196
  • Lastpage
    199
  • Abstract
    We describe the patterning of multilayered foil by irradiation with excimer laser. The foil consisted of an upper layer of lacquer/ intermediate layers of polymer and Al/ a base layer of low melting point resin. Ablation of the foil was characterised by a sequential removal of the layers in the structure. A critical level of fluence and number of pulses was required to ablate each of the additional layers. Four threshold levels of damage have been identified as i) damage to the upper lacquer layer without removal, ii) the removal of the lacquer layer, iii) the removal of the intermediate layers and iv) the removal of all layers. Measurements of the ablation depth for a single pulse have shown a logarithmic dependence on laser fluence within the upper and intermediate layers.
  • Keywords
    diffraction gratings; laser ablation; optical arrays; polymers; ablation depth; excimer laser; grating arrays; irradiation; lacquer layer; multilayered foil; patterning; polymer; Diffraction gratings; Lacquers; Laser ablation; Laser transitions; Optical arrays; Optical diffraction; Optical pulses; Polymers; Resins; Substrates; ablation; component; excimer laser; fluence; multilayered foil;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoscience and Nanotechnology, 2008. ICONN 2008. International Conference on
  • Conference_Location
    Melbourne, Vic.
  • Print_ISBN
    978-1-4244-1503-8
  • Electronic_ISBN
    978-1-4244-1504-5
  • Type

    conf

  • DOI
    10.1109/ICONN.2008.4639280
  • Filename
    4639280