DocumentCode
3030330
Title
Structuring of grating arrays in multilayered foil by excimer laser
Author
Leech, Patrick W. ; McCarthy, Lawry ; Osvath, Peter
Author_Institution
CSIRO CSME, Clayton, VIC
fYear
2008
fDate
25-29 Feb. 2008
Firstpage
196
Lastpage
199
Abstract
We describe the patterning of multilayered foil by irradiation with excimer laser. The foil consisted of an upper layer of lacquer/ intermediate layers of polymer and Al/ a base layer of low melting point resin. Ablation of the foil was characterised by a sequential removal of the layers in the structure. A critical level of fluence and number of pulses was required to ablate each of the additional layers. Four threshold levels of damage have been identified as i) damage to the upper lacquer layer without removal, ii) the removal of the lacquer layer, iii) the removal of the intermediate layers and iv) the removal of all layers. Measurements of the ablation depth for a single pulse have shown a logarithmic dependence on laser fluence within the upper and intermediate layers.
Keywords
diffraction gratings; laser ablation; optical arrays; polymers; ablation depth; excimer laser; grating arrays; irradiation; lacquer layer; multilayered foil; patterning; polymer; Diffraction gratings; Lacquers; Laser ablation; Laser transitions; Optical arrays; Optical diffraction; Optical pulses; Polymers; Resins; Substrates; ablation; component; excimer laser; fluence; multilayered foil;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanoscience and Nanotechnology, 2008. ICONN 2008. International Conference on
Conference_Location
Melbourne, Vic.
Print_ISBN
978-1-4244-1503-8
Electronic_ISBN
978-1-4244-1504-5
Type
conf
DOI
10.1109/ICONN.2008.4639280
Filename
4639280
Link To Document