Microcrystalline Si and (Si,Ge) solar cells on plastic substrates

Author

Dalal, Vikram L. ; Erickson, Karl

Author_Institution

Dept. of Electr. Eng. & Comput. Eng., Iowa State Univ., Ames, IA, USA

fYear

2000

fDate

2000

Firstpage

792

Lastpage

795

Abstract

We report on the growth of microcrystalline Si and (Si,Ge) films and devices on polyimide substrates. The films and devices were grown using remote plasma CVD process using a remote, low pressure ECR reactor. The substrates were Mo coated polyimide. The devices were of the p-n-n+ type. The crystalline quality of the films was determined using Raman measurements. Novel buffer layers were used to increase the voltage in the device. The devices show excellent voltages, fill factors and quantum efficiency

Keywords

Ge-Si alloys; Raman spectra; elemental semiconductors; plasma CVD; semiconductor growth; semiconductor materials; silicon; solar cells; (Si,Ge) solar cells; Mo coated polyimide; Raman measurements; Si; Si:H solar cells; SiGe; buffer layers; crystalline quality; fill factors; growth; low pressure ECR reactor; microcrystalline Si; p-n-n+ type devices; plastic substrates; polyimide substrates; quantum efficiency; remote plasma CVD process; voltage; Buffer layers; Crystallization; Inductors; Photovoltaic cells; Plasma devices; Plasma measurements; Plastics; Polyimides; Semiconductor films; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Photovoltaic Specialists Conference, 2000. Conference Record of the Twenty-Eighth IEEE

Conference_Location

Anchorage, AK

ISSN

0160-8371

Print_ISBN

0-7803-5772-8

Type

conf

DOI

10.1109/PVSC.2000.916002

Filename

916002