DocumentCode :
3030458
Title :
Power switch optimization and sizing in 65nm PD-SOI considering supply voltage noise
Author :
Le Coz, J. ; Valentian, A. ; Flatresse, P. ; Belleville, M.
Author_Institution :
STMicroelectronics, Crolles, France
fYear :
2010
fDate :
2-4 June 2010
Firstpage :
186
Lastpage :
189
Abstract :
In this paper, several power gating solutions are analysed in 65 nm PDSOI technology, taking into account the implementation area. A new figure of merit has been proposed to easily determine the best tradeoff between leakage, drive current and area. It shows that the best solution is to use a Body-Contacted transistor with a non-minimal gate length, enabling leakage currents of the same order of magnitude than in Bulk. A second analysis on specific PD-SOI Logic CORE electrical behaviour has been performed. This analysis allows determining the power switch network sizing implementation taking into account decoupling capacitance, ON Logic CORE current and equivalent parasitic supply inductance.
Keywords :
leakage currents; silicon-on-insulator; switches; switching circuits; transistors; PD-SOI logic core electrical behaviour; body-contacted transistor; decoupling capacitance; equivalent parasitic supply inductance; figure of merit; leakage currents; nonminimal gate length; power gating solutions; power switch network sizing; power switch optimization; size 65 nm; supply voltage noise; Circuits; Inductance; Leakage current; Logic; MOSFETs; Parasitic capacitance; Power dissipation; Silicon on insulator technology; Switches; Voltage; 65nm PD-SOI; Decoupling Capacitance; MTCMOS; Parasitic Inductance; Power Switch;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
IC Design and Technology (ICICDT), 2010 IEEE International Conference on
Conference_Location :
Grenoble
Print_ISBN :
978-1-4244-5773-1
Type :
conf
DOI :
10.1109/ICICDT.2010.5510263
Filename :
5510263
Link To Document :
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