Title :
Expanding thermal plasma CVD of textured ZnO with focus on solar cell applications
Author :
Groenen, R. ; van de Sanden, M.C.M. ; Löffler, J. ; Schropp, R.E.I. ; Linden, J.L.
Author_Institution :
Dept. of Phys., Eindhoven Univ. of Technol., Netherlands
Abstract :
A new method for low temperature deposition of surface textured ZnO is presented utilizing an expanding thermal plasma created by a cascaded arc. Films have been deposited at 150-350°C at a rate of typically 0.65-0.75 nm/s, exhibiting low sheet resistance (<10 Ω/□), high transmittance (>80%) and a rough surface texture. Surface roughness increases with increasing deposition temperature and film thickness. First pin a-Si:H solar cells deposited on this ZnO show initial efficiencies approaching 10%
Keywords :
II-VI semiconductors; plasma CVD; rough surfaces; semiconductor growth; solar cells; substrates; surface texture; surface topography; zinc compounds; 150 to 350 degC; Si:H; ZnO; cascaded arc; deposition temperature; efficiencies; expanding thermal plasma CVD; film thickness; high transmittance; low sheet resistance; low temperature deposition; pin a-Si:H solar cells; rough surface texture; solar cell applications; surface roughness; textured ZnO; Optical films; Photovoltaic cells; Plasma applications; Plasma temperature; Scanning electron microscopy; Surface morphology; Surface resistance; Surface texture; Thermal expansion; Zinc oxide;
Conference_Titel :
Photovoltaic Specialists Conference, 2000. Conference Record of the Twenty-Eighth IEEE
Conference_Location :
Anchorage, AK
Print_ISBN :
0-7803-5772-8
DOI :
10.1109/PVSC.2000.916009
