Physical characterization of RF sputtered lithium niobate films

The results of a number of analytical measurements on lithium niobate films deposited on silicon and sapphire substrates of different orientations are reported. It has been determined that high-quality LiNbO₃ films can be deposited on various substrates through RF sputtering. It has been established that the orientation and crystallinity of the films is dependent on many parameters. The most important of which are the substrate material and its temperature. Optimizing these parameters has shown that it is possible to produce stoichiometric, polycrystalline thin films of LiNbO₃ on both silicon and sapphire substrates. It has also been shown that the conduction process in these films is most likely the result of Frenkel-Poole hopping. The optical quality of the films indicates that waveguiding and such applications as optical doubling, switching, and modulation are possible using these films