Title :
Direct and post-discharges in environmental applications of cold plasmas
Author :
Youbi, G. Kamgang ; Naitali, M. ; Herry, J.-M. ; Hnatiuc, E. ; Brisset, J.-L.
Author_Institution :
Chem. Dept., Univ. of Rouen, Mont-St. Aignan, France
Abstract :
Discharges in humid air are valuable tools for producing active species which react both at the liquid surface of the targets and in the solution. These species are responsible for a noticeable abatement of the pollutant concentration, even of recalcitrant compounds. The relevant kinetics are examined with special emphasis on Temporal Post Discharges Reactions which develop in the solution after the discharge is switched off and without supplying extra energy. The moieties responsible for this feature are discussed and arguments favour H2O2 and peroxynitrous acid. ONO2H, which degrades lipoproteins is probably involved in the attacks at the bacterial membranes causing the death of the microorganisms. TPDR are also identified in case of bacterial inactivation. Plasma activated water induces inactivation of bacterial colonies even 24 h after the plasma treatment. Developments to improve the efficacy of the discharges and reduce the running costs are presented.
Keywords :
air; biological techniques; discharges (electric); hydrogen compounds; microorganisms; molecular biophysics; organic compounds; plasma applications; plasma chemistry; proteins; H2O2; bacterial colony inactivation; bacterial membranes; direct discharge; humid air; lipoproteins; liquid surface; microorganism; peroxynitrous acid; plasma activated water; plasma treatment; pollutant concentration; recalcitrant compounds; temporal post discharge reaction; Degradation; Environmental factors; Kinetic theory; Microorganisms; Plasma applications; Plasma chemistry; Pollution; Process control; Surface discharges; Surface fitting; Bacterial inactivation; Chemical reactions; Electric discharges; Post-discharge; Waste removal;
Conference_Titel :
Optimization of Electrical and Electronic Equipment (OPTIM), 2010 12th International Conference on
Conference_Location :
Basov
Print_ISBN :
978-1-4244-7019-8
DOI :
10.1109/OPTIM.2010.5510545