DocumentCode :
3037643
Title :
Ferroelectric layers made by thermal decomposition of organometallic compounds
Author :
Klee, M. ; Schnabel, P. ; Brand, W. ; Mauczok, R.
Author_Institution :
Philips GmbH Forschungslab. Aachen, Germany
fYear :
1990
fDate :
6-8 Jun 1990
Firstpage :
685
Lastpage :
688
Abstract :
The thermal decomposition of organometallic compounds was used to deposit ferroelectric (Pb,La)TiO3 and Pb(Ti,Zr)O3 films onto Pt and Si substrates by spin-coating and dip-coating techniques. Crystalline films with remanent polarizations of 8-11 μC/cm2 and coercive field strengths of 39-68 kV/cm were obtained
Keywords :
coating techniques; ferroelectric thin films; lanthanum compounds; lead compounds; pyrolysis; (PbLa)TiO3; PZT; PbZrO3TiO3; Pt substrates; Si substrates; coercive field strengths; crystalline films; dip-coating; ferroelectric; films; organometallic compounds; remanent polarizations; spin-coating; thermal decomposition; Crystallization; Ferroelectric films; Ferroelectric materials; Grain size; Optical films; Semiconductor films; Substrates; Thermal decomposition; X-ray diffraction; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Applications of Ferroelectrics, 1990., IEEE 7th International Symposium on
Conference_Location :
Urbana-Champaign, IL
Print_ISBN :
0-7803-0190-0
Type :
conf
DOI :
10.1109/ISAF.1990.200347
Filename :
200347
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3037643
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