DocumentCode
3038203
Title
Application of TEM for distinguishing the primary and secondary abrasives of undiluted CMP slurry
Author
Sun, C.J. ; Tai, L.A. ; Sharma, Parmanand ; Ko, Y.F. ; Chen, Yu Christine ; Chu, C.H. ; Hsieh, Y.F. ; Yang, C.S. ; Yew, T.R.
Author_Institution
Center for Nanomedicine Res., Nat. Health Res. Inst., Zhunan, Taiwan
fYear
2013
fDate
15-19 July 2013
Firstpage
400
Lastpage
403
Abstract
Determination of morphology and size distribution of primary and secondary abrasives of slurry is essential for optimization of CMP performance. The undiluted slurry was characterized in liquid phase using silicon based Nano-pipettes in TEM. To validate utility of Nano-pipettes, comparatively quantitative analysis was performed by cryo-TEM technique.
Keywords
abrasives; chemical mechanical polishing; silicon; transmission electron microscopy; CMP performance optimization; cryo-TEM technique; liquid phase; morphology determination; primary abrasive; quantitative analysis; secondary abrasive; silicon based nano-pipettes; size distribution; undiluted CMP slurry; Decision support systems; Failure analysis; Integrated circuits;
fLanguage
English
Publisher
ieee
Conference_Titel
Physical and Failure Analysis of Integrated Circuits (IPFA), 2013 20th IEEE International Symposium on the
Conference_Location
Suzhou
ISSN
1946-1542
Print_ISBN
978-1-4799-1241-4
Type
conf
DOI
10.1109/IPFA.2013.6599189
Filename
6599189
Link To Document