DocumentCode :
303821
Title :
A neural networks approach to control the temperature on rapid thermal processing
Author :
Fortuna, L. ; Muscato, G. ; Nunnari, G. ; Papaleo, R.
Author_Institution :
Dipartimento Elettrico, Elettronico e Sistemistico, Catania Univ., Italy
Volume :
2
fYear :
1996
fDate :
13-16 May 1996
Firstpage :
649
Abstract :
In this paper an innovative strategy based on neural networks has been introduced for modeling of rapid thermal processes (RTP) in semiconductor wafer fabrication. The nonlinearity of the mentioned processes has been successfully dealt and a satisfactory model has been derived. Numerical simulations emphasize the suitability of the introduced approach
Keywords :
control nonlinearities; integrated circuit manufacture; neurocontrollers; rapid thermal processing; temperature control; RTP modeling; neural networks; nonlinearity; rapid thermal processing; semiconductor wafer fabrication; temperature control; Annealing; Control systems; Infrared heating; Lamps; Neural networks; Oxidation; Rapid thermal processing; Semiconductor device modeling; Semiconductor process modeling; Temperature control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrotechnical Conference, 1996. MELECON '96., 8th Mediterranean
Conference_Location :
Bari
Print_ISBN :
0-7803-3109-5
Type :
conf
DOI :
10.1109/MELCON.1996.551303
Filename :
551303
Link To Document :
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