DocumentCode
303821
Title
A neural networks approach to control the temperature on rapid thermal processing
Author
Fortuna, L. ; Muscato, G. ; Nunnari, G. ; Papaleo, R.
Author_Institution
Dipartimento Elettrico, Elettronico e Sistemistico, Catania Univ., Italy
Volume
2
fYear
1996
fDate
13-16 May 1996
Firstpage
649
Abstract
In this paper an innovative strategy based on neural networks has been introduced for modeling of rapid thermal processes (RTP) in semiconductor wafer fabrication. The nonlinearity of the mentioned processes has been successfully dealt and a satisfactory model has been derived. Numerical simulations emphasize the suitability of the introduced approach
Keywords
control nonlinearities; integrated circuit manufacture; neurocontrollers; rapid thermal processing; temperature control; RTP modeling; neural networks; nonlinearity; rapid thermal processing; semiconductor wafer fabrication; temperature control; Annealing; Control systems; Infrared heating; Lamps; Neural networks; Oxidation; Rapid thermal processing; Semiconductor device modeling; Semiconductor process modeling; Temperature control;
fLanguage
English
Publisher
ieee
Conference_Titel
Electrotechnical Conference, 1996. MELECON '96., 8th Mediterranean
Conference_Location
Bari
Print_ISBN
0-7803-3109-5
Type
conf
DOI
10.1109/MELCON.1996.551303
Filename
551303
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