• DocumentCode
    3038317
  • Title

    Carbon nanotube electronics - Materials, devices, circuits, design, modeling, and performance projection

  • Author

    Wong, H. -S Philip ; Mitra, Subhasish ; Akinwande, Deji ; Beasley, Cara ; Chai, Yang ; Chen, Hong-Yu ; Chen, Xiangyu ; Close, Gael ; Deng, Jie ; Hazeghi, Arash ; Liang, Jiale ; Lin, Albert ; Liyanage, Luckshitha S. ; Luo, Jieying ; Parker, Jason ; Patil,

  • Author_Institution
    Dept. of Electr. Eng., Stanford Univ., Stanford, CA, USA
  • fYear
    2011
  • fDate
    5-7 Dec. 2011
  • Abstract
    This paper summarizes a multi-disciplinary effort to realize the high expectations of the use of carbon nanotube (CNT) as a material for highly energy-efficient future digital systems. Today CNTs are grown on full wafers, highly aligned in one direction, and subsequently transferred to a target substrate multiple times for increased CNT density. Device level performance of carbon nanotube transistor (CNFET) rivals the best silicon transistor. Inherent CNT imperfections such as mis-positioned and metallic CNTs have been overcome through a combination of processing and imperfection-immune design techniques. As a result, CNFET-based digital arithmetic and storage circuit are fabricated using conventional optical lithography steppers and fabrication tools, some of them at full wafer scale. CNT interconnects with sub-ns delays have been measured using ring oscillators. Physics-based analytical and compact models have been developed to enable circuit design, circuit-level analysis of CNT-specific variations, and performance projection at the device, circuit, and system level. It is projected that CNFET circuits can enable 5x speed-up at the same power consumption over Si CMOS(PDSOI) at the 11 nm technology node for a four-core processor with 1.5M logic gates and 5MB SRAM per core. CNFET is the only FET that is projected to outperform the 11 nm node ITRS target.
  • Keywords
    SRAM chips; carbon nanotube field effect transistors; carbon nanotubes; digital arithmetic; logic gates; oscillators; photolithography; semiconductor device models; C; CMOS PDSOI; CNFET; CNFET-based digital arithmetic; CNFET-based storage circuit; CNT density; CNT electronic; CNT material; CNT subns delay interconnection; SRAM; carbon nanotube electronic; carbon nanotube material; carbon nanotube transistor; circuit design; circuit-level analysis; four-core processor; imperfection-immune design technique; logic gate; memory size 5 MByte; metallic CNT; optical lithography stepper; power consumption; ring oscillator; size 11 nm; CNTFETs; Delay; Integrated circuit modeling; Logic gates; Metals; Performance evaluation; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2011 IEEE International
  • Conference_Location
    Washington, DC
  • ISSN
    0163-1918
  • Print_ISBN
    978-1-4577-0506-9
  • Electronic_ISBN
    0163-1918
  • Type

    conf

  • DOI
    10.1109/IEDM.2011.6131594
  • Filename
    6131594