DocumentCode :
3038459
Title :
New understanding of the statistics of random telegraph noise in Si nanowire transistors - the role of quantum confinement and non-stationary effects
Author :
Liu, Changze ; Wang, Yangyuan ; Zou, Jibin ; Huang, Ru ; Fan, Chunhui ; Zhang, Lijie ; Fan, Jiewen ; Ai, Yujie ; Yangyuan Wang
Author_Institution :
Key Lab. of Microelectron. Devices & Circuits, Peking Univ., Beijing, China
fYear :
2011
fDate :
5-7 Dec. 2011
Abstract :
In this paper, the random telegraph noise (RTN) statistics in silicon nanowire transistors (SNWTs) are comprehensively studied. The capture/emission time constants and probabilities are found to be strongly impacted by the quantum confinement in SNWTs, which cannot be fully explained by classical RTN theory. A full quantum RTN model for SNWTs is proposed for fundamental understanding of the experiments. The characteristics of non-stationary RTN in SNWTs under high-field biases are studied for the first time, based on the developed statistical trap-response (STR) characterization method. The trap capture probability is found to be much different from that of the quasi-stationary RTN, leading to large errors in circuit aging prediction if using traditional RTN distributions. These new understandings are critical for robust SNWT circuit design against RTN.
Keywords :
elemental semiconductors; nanowires; probability; random noise; semiconductor device models; silicon; transistors; RTN distribution; RTN statistic; SNWT; STR characterization method; Si; capture-emission time constant; capture-emission time probability; classical RTN theory; full quantum RTN model; high-field bias; nonstationary RTN effect; quantum confinement; quasistationary RTN effect; random telegraph noise statistic; silicon nanowire transistor; statistical trap-response characterization method; trap capture probability; Logic gates; Potential well; Stress; Temperature measurement; Time measurement; Weibull distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2011 IEEE International
Conference_Location :
Washington, DC
ISSN :
0163-1918
Print_ISBN :
978-1-4577-0506-9
Electronic_ISBN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.2011.6131599
Filename :
6131599
Link To Document :
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