GaN-based multi-junction diode with low reverse leakage current using P-type barrier controlling layer

We present a novel GaN-based diode with low reverse leakage current which ensures the high voltage operation up to 600V. The diode consists of multi-junctions of AlGaN/GaN with a p-GaN overlayer where the anode and cathode are formed on the sidewalls of the channels. The tunneling current which is the origin of the leakage current can be reduced by controlling the potential barrier at the anode sidewall by means of the depletion layer from the p-GaN. The fabricated GaN diode with the p-type barrier controlling layer (BCL) exhibits high forward current of 18A at 1.5V with the breakdown voltages over 600V taking advantages of the reduced leakage current. The fabricated GaN-based diode has smaller R_onC of 70 pΩF than 95 pΩF of the commercially available SiC Schottky barrier diode (SBD) indicating that the GaN diode is suitable for power switching. The GaN diode exhibits high conversion efficiency of 98.2 % in the voltage boosting converter at the output voltage of 400V by combining it with a GaN Gate Injection Transistor (GIT). The obtained performance by using the GaN diode is superior to that with a SiC SBD.