• DocumentCode
    3039067
  • Title

    ESD detection circuit with reverse-used RC network in a 90-nm CMOS process

  • Author

    Yang, Z.N. ; Liu, H.X. ; Wang, S.L.

  • Author_Institution
    Sch. of Microelectron., Xidian Univ., Xi´an, China
  • fYear
    2013
  • fDate
    15-19 July 2013
  • Firstpage
    583
  • Lastpage
    586
  • Abstract
    The gate leakage current issue in nanometer CMOS process is serious. An ESD detection circuit with reverse-used RC network is proposed in a 90-nm CMOS process. It reduces the leakage current in RC network by reducing the area of MOS capacitor and avoiding high voltage drop across MOS capacitor. The leakage current is 5.7 nA at 25°C. The total capacitor area used is only 4 μm2. Under ESD event, it can generate 39 mA trigger current to turn on the SCR.
  • Keywords
    CMOS integrated circuits; MOS capacitors; MOS-controlled thyristors; RC circuits; electrostatic discharge; leakage currents; ESD detection circuit; MOS capacitor; SCR; current 39 mA; current 5.7 nA; gate leakage current issue; nanometer CMOS process; reverse-used RC network; size 90 nm; temperature 25 degC; CMOS integrated circuits; CMOS process; Clamps; Decision support systems; Electrostatic discharges; Failure analysis;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Physical and Failure Analysis of Integrated Circuits (IPFA), 2013 20th IEEE International Symposium on the
  • Conference_Location
    Suzhou
  • ISSN
    1946-1542
  • Print_ISBN
    978-1-4799-1241-4
  • Type

    conf

  • DOI
    10.1109/IPFA.2013.6599228
  • Filename
    6599228