Title :
A new 3-D MCM fabrication technology for high-speed chip-to-chip communication: vertically connected thin-film chip (VCTC) technology
Author :
Takahashi, S. ; Onodera, T. ; Hayashi, Y. ; Kunio, T.
Author_Institution :
Microelectron. Res. Labs., NEC Corp., Sagamihara, Japan
Abstract :
A new 3-D MCM fabrication technology referred as "Vertically Connected Thin-film Chip (VCTC)" technology, has been developed. The VCTC process consists of chip thinning by CMP, the thinned-chip stacking by polyimide adhesive, and vertical interconnection formation by polyimide dry-etching and gold plating. From the SPICE simulation, short line length is a main factor to realize high-speed inter-chip communication with small delay, so the VCTC technology is effective on high-speed systems.
Keywords :
SPICE; integrated circuit interconnections; multichip modules; thin film circuits; 3-D MCM fabrication; Au; CMP; SPICE simulation; VCTC technology; chip thinning; dry etching; gold plating; high-speed inter-chip communication; polyimide adhesive; stacking; vertically connected thin-film chip; Bonding; Etching; Fabrication; Gold; Laboratories; Microelectronics; Polyimides; Stacking; Substrates; Transistors;
Conference_Titel :
VLSI Technology, 1995. Digest of Technical Papers. 1995 Symposium on
Conference_Location :
Kyoto, Japan
Print_ISBN :
0-7803-2602-4
DOI :
10.1109/VLSIT.1995.520894