Title :
Self-organization of highly ordered mosaic structure of porous silicon at long anodic etching of p-type silicon in the electrolyte with internal current source
Author :
Tynyshtykbaev, Kurbangali B.
Author_Institution :
Inst. of Phys. & Technol., Almaty, Kazakhstan
Abstract :
Self-organization of highly ordered mosaic structure of porous Si at long anodic etching of p-Si (100) in electrolyte with internal source of the current is observed. Sizes of the nanocrystallites islets of porous Si, the period of their location and self-organization of the mosaic structure of porous silicon are defined by the effect of forces of elastically-deformation, defect-deformation and capillary-fluctuation that exist at the interface of electrolyte/porous Si/c-Si/ in process of pores formation. Process of spontaneous formation of mosaic structure por-Si has place in results from relaxation of the elastically-strained layer of porous surface and effect of capillary-fluctuation forces. Conditions of development of these forces depend on the self-coordinated parameters of etching of interface heterophase of electrochemical system the electrolyte/porous Si/c-Si/ and parameters of electrodes and electrochemical cell.
Keywords :
anodisation; cells (electric); elastic deformation; electrodes; electrolytes; elemental semiconductors; etching; mosaic structure; porous semiconductors; self-assembly; silicon; Si; anodic etching; capillary fluctuation; defect deformation; elastic deformation; electrochemical cell; electrochemical system; electrolyte; highly ordered mosaic structure; interface heterophase; internal current source; nanocrystallite islets; p-type silicon; porous silicon; self-coordinated parameters; self-organization; Atomic layer deposition; Etching; Hafnium; Silicon; Surface cracks; Surface morphology; electrolyte; interface; mosaic structure; nanocrystallites; porous Si; self-organization; surface;
Conference_Titel :
Multimedia Technology (ICMT), 2011 International Conference on
Conference_Location :
Hangzhou
Print_ISBN :
978-1-61284-771-9
DOI :
10.1109/ICMT.2011.6002582