A new initiative in microelectronics processing at Georgia Tech

Author

Zhou, Zhiping

Author_Institution

Microelectron. Res. Center, Georgia Inst. of Technol., Atlanta, GA, USA

fYear

1999

fDate

1999

Firstpage

10

Lastpage

15

Abstract

Georgia Tech has initiated a CMOS baseline process through its Microelectronics Research Center (MiRC) aiming at a new level of clean room discipline and process capability. The new initiative is also intended to establish a “platform” for research on a variety of new materials and device structures, It will support a whole range of advanced CMOS related research, such as multichannel chemical sensor array, MEMS, gate stack reengineering, and shallow junction CMOS. It will also support educational programs in processing and design of CMOS devices at Georgia Tech. This paper will detail the plan and the progress of the new CMOS initiative

Keywords

CMOS integrated circuits; clean rooms; electronic engineering education; integrated circuit technology; CMOS device; Georgia Tech; MEMS; Microelectronics Research Center; clean room; educational program; gate stack reengineering; microelectronics processing; multichannel chemical sensor array; shallow junction; CMOS process; CMOS technology; Chemical sensors; Electronics industry; Fabrication; MOS devices; MOSFETs; Microelectronics; Semiconductor materials; Sensor arrays;

fLanguage

English

Publisher

ieee

Conference_Titel

University/Government/Industry Microelectronics Symposium, 1999. Proceedings of the Thirteenth Biennial

Conference_Location

Minneapolis, MN

Print_ISBN

0-7803-5240-8

Type

conf

DOI

10.1109/UGIM.1999.782812

Filename

782812