Title :
A new initiative in microelectronics processing at Georgia Tech
Author_Institution :
Microelectron. Res. Center, Georgia Inst. of Technol., Atlanta, GA, USA
Abstract :
Georgia Tech has initiated a CMOS baseline process through its Microelectronics Research Center (MiRC) aiming at a new level of clean room discipline and process capability. The new initiative is also intended to establish a “platform” for research on a variety of new materials and device structures, It will support a whole range of advanced CMOS related research, such as multichannel chemical sensor array, MEMS, gate stack reengineering, and shallow junction CMOS. It will also support educational programs in processing and design of CMOS devices at Georgia Tech. This paper will detail the plan and the progress of the new CMOS initiative
Keywords :
CMOS integrated circuits; clean rooms; electronic engineering education; integrated circuit technology; CMOS device; Georgia Tech; MEMS; Microelectronics Research Center; clean room; educational program; gate stack reengineering; microelectronics processing; multichannel chemical sensor array; shallow junction; CMOS process; CMOS technology; Chemical sensors; Electronics industry; Fabrication; MOS devices; MOSFETs; Microelectronics; Semiconductor materials; Sensor arrays;
Conference_Titel :
University/Government/Industry Microelectronics Symposium, 1999. Proceedings of the Thirteenth Biennial
Conference_Location :
Minneapolis, MN
Print_ISBN :
0-7803-5240-8
DOI :
10.1109/UGIM.1999.782812
