Title :
Applications of mathematical systems science to nanolithography of integrated circuits
Author :
Schaper, C. ; Kailath, T.
Author_Institution :
Inf. Syst. Lab., Stanford Univ., CA, USA
Abstract :
An overview is given describing applications of multivariable control, signal processing, optimization, modeling and computation to the lithography sequence. We discuss areas in the patterning process where mathematical methods can play a significant role including optical proximity correction, phase shifting mask design, alignment, and stage control for nanopositioning. We also include a discussion on systems applications in the general area of photoresist processing for lithography with emphasis on the thermal process
Keywords :
integrated circuit modelling; lithography; masks; multivariable control systems; nanotechnology; optimisation; photolithography; process control; signal processing; alignment; integrated circuits; mathematical systems science; modeling; multivariable control; nanolithography; nanopositioning; optical proximity correct; optimization; overview; patterning process; phase shifting mask design; photoresist processing; signal processing; stage control; systems applications; thermal process; Application specific integrated circuits; Computational modeling; Integrated circuit modeling; Lithography; Nanolithography; Optical sensors; Optical signal processing; Particle beam optics; Resists; Temperature sensors;
Conference_Titel :
University/Government/Industry Microelectronics Symposium, 1999. Proceedings of the Thirteenth Biennial
Conference_Location :
Minneapolis, MN
Print_ISBN :
0-7803-5240-8
DOI :
10.1109/UGIM.1999.782836
