DocumentCode :
3041833
Title :
Transient thermomechanical study of a thick-wire bond with particular attention to the interfacial shearing stress
Author :
Nagl, Bernhard ; Suhir, Ephraim ; Gschohsmann, Walter ; Nicolics, Johann
Author_Institution :
Dept. of Appl. Electron. Mater., Vienna Univ. of Technol., Vienna, Austria
fYear :
2012
fDate :
9-13 May 2012
Firstpage :
339
Lastpage :
344
Abstract :
A high-power IGBT (Isolated Gate Bipolar Transistor) module has been thermomechanically analyzed in the moment of switching on short circuit. We studied the extremely rapidly changing temperature distribution within a wire bond by a transient thermal simulation on the basis of an experimentally determined power loss as function of time, a finite element simulation of thermomechanically induced stress and strain distribution within the bond-wire wedge and the silicon chip, and a simple but meaningful analytical model of the same arrangement, with special attention to the interfacial shearing stress as function of time. The analyses revealed a surprising result: during the first few microseconds the extremely high power loss density in the silicon chip causes a rapid temperature increase and expansion of the silicon chip which leads to a tensile stress in the aluminum bond wire, whereas in the consecutive phase the temperature of the aluminum wire approaches the one of the chip, whereby the aluminum wire turns to compressive stress which means a reversal of shear stress at the wire/chip interface. This could be a new explanation for the field failures known.
Keywords :
aluminium; bipolar transistors; finite element analysis; insulated gate bipolar transistors; shear strength; aluminum wire; bond-wire wedge; finite element simulation; high power loss density; high-power IGBT; interfacial shearing stress; isolated gate bipolar transistor; rapid temperature increase; silicon chip; strain distribution; tansient thermomechanical study; temperature distribution; thermomechanically analyzed; thermomechanically induced stress; thick-wire bond; transient thermal simulation; Analytical models; Bonding; Insulated gate bipolar transistors; Shearing; Silicon; Stress; Wires;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Technology (ISSE), 2012 35th International Spring Seminar on
Conference_Location :
Bad Aussee
ISSN :
2161-2528
Print_ISBN :
978-1-4673-2241-6
Electronic_ISBN :
2161-2528
Type :
conf
DOI :
10.1109/ISSE.2012.6273156
Filename :
6273156
Link To Document :
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