DocumentCode :
3041843
Title :
AlGaN/AlN/GaN High Electron Mobility Transistors with Improved Carrier Transport
Author :
Parish, Gia ; Umana-Membreno, Gilberto A. ; Jolley, Stephen M. ; Buttari, Dario ; Keller, Stacia ; Nener, Brett D. ; Mishra, Umesh K.
Author_Institution :
Sch. of Electr., Electron. & Comput. Eng., Western Australia Univ., Crawley, WA
fYear :
2004
fDate :
8-8 Dec. 2004
Firstpage :
29
Lastpage :
32
Abstract :
Geo-magneto-resistance measurements have been made on AlGaN/GaN HEMT structures both with and without an AlN interlayer. The results show significantly higher carrier mobility at low temperatures for devices with the interlayer. Furthermore, the drop in mobility with increasing 2DEG density, commonly exhibited by AlGaN/GaN HEMTs, is dramatically reduced by introduction of the interlayer. These results provide insight into the role of alloy and interface roughness scattering on 2DEG properties
Keywords :
aluminium compounds; carrier mobility; gallium compounds; high electron mobility transistors; interface roughness; magnetoresistance; semiconductor device measurement; two-dimensional electron gas; wide band gap semiconductors; 2DEG density; AlGaN-AlN-GaN; AlGaN/AlN/GaN high electron mobility transistors; Geo-magneto-resistance; carrier mobility; carrier transport; interface roughness; Aluminum gallium nitride; Breakdown voltage; Charge carrier density; Electron mobility; Frequency; Gallium nitride; HEMTs; MODFETs; Microwave transistors; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optoelectronic and Microelectronic Materials and Devices, 2004 Conference on
Conference_Location :
Brisbane, Qld.
Print_ISBN :
0-7803-8820-8
Type :
conf
DOI :
10.1109/COMMAD.2004.1577484
Filename :
1577484
Link To Document :
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