DocumentCode
304185
Title
Sputtered barium titanate films for capacitor applications
Author
Tsao, Bang Hung ; Carr, Sandra Fries ; Weimer, Joseph A.
Author_Institution
K Syst. Corp., Dayton, OH, USA
Volume
1
fYear
1996
fDate
11-16 Aug 1996
Firstpage
560
Abstract
BaTiO3 film prepared by RF sputtering was studied for capacitor applications. The films produced have a capacitance storage of 0.85 μF/cm2, with a high resistivity of 1014 Ω-cm and low dissipation factor of 0.005. The dielectric constant of these BaTiO3 films is approximately 30, which is superior to that of the typical polymer film capacitor and has little dependence on frequency. However, the breakdown strength of BaTiO3 under the present condition is approximately 30 MV/meter which is about one order magnitude lower than expected. The theoretical breakdown strength of BaTiO3 is reported to be as high as 200 MV/m. The processing of BaTiO3 films must be optimized to obtain the potential benefit of the BaTiO3
Keywords
barium compounds; capacitors; electric breakdown; electric strength; electrical resistivity; permittivity; sputtered coatings; titanium compounds; BaTiO3; BaTiO3 film; RF sputtered film; breakdown strength; capacitance storage; capacitor applications; dielectric constant; high resistivity; low dissipation factor; polymer film capacitor; sputtered barium titanate films; Barium; Capacitance; Capacitors; Conductivity; Dielectric constant; Electric breakdown; Polymer films; Radio frequency; Sputtering; Titanium compounds;
fLanguage
English
Publisher
ieee
Conference_Titel
Energy Conversion Engineering Conference, 1996. IECEC 96., Proceedings of the 31st Intersociety
Conference_Location
Washington, DC
ISSN
1089-3547
Print_ISBN
0-7803-3547-3
Type
conf
DOI
10.1109/IECEC.1996.552944
Filename
552944
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