• DocumentCode
    304185
  • Title

    Sputtered barium titanate films for capacitor applications

  • Author

    Tsao, Bang Hung ; Carr, Sandra Fries ; Weimer, Joseph A.

  • Author_Institution
    K Syst. Corp., Dayton, OH, USA
  • Volume
    1
  • fYear
    1996
  • fDate
    11-16 Aug 1996
  • Firstpage
    560
  • Abstract
    BaTiO3 film prepared by RF sputtering was studied for capacitor applications. The films produced have a capacitance storage of 0.85 μF/cm2, with a high resistivity of 1014 Ω-cm and low dissipation factor of 0.005. The dielectric constant of these BaTiO3 films is approximately 30, which is superior to that of the typical polymer film capacitor and has little dependence on frequency. However, the breakdown strength of BaTiO3 under the present condition is approximately 30 MV/meter which is about one order magnitude lower than expected. The theoretical breakdown strength of BaTiO3 is reported to be as high as 200 MV/m. The processing of BaTiO3 films must be optimized to obtain the potential benefit of the BaTiO3
  • Keywords
    barium compounds; capacitors; electric breakdown; electric strength; electrical resistivity; permittivity; sputtered coatings; titanium compounds; BaTiO3; BaTiO3 film; RF sputtered film; breakdown strength; capacitance storage; capacitor applications; dielectric constant; high resistivity; low dissipation factor; polymer film capacitor; sputtered barium titanate films; Barium; Capacitance; Capacitors; Conductivity; Dielectric constant; Electric breakdown; Polymer films; Radio frequency; Sputtering; Titanium compounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Energy Conversion Engineering Conference, 1996. IECEC 96., Proceedings of the 31st Intersociety
  • Conference_Location
    Washington, DC
  • ISSN
    1089-3547
  • Print_ISBN
    0-7803-3547-3
  • Type

    conf

  • DOI
    10.1109/IECEC.1996.552944
  • Filename
    552944