Title :
Sensor fusion for ULSI manufacturing process control
Author :
Moslehi, M.M. ; Velo, L. ; Najm, H. ; Breedijk, T. ; Dostalik, B.
Author_Institution :
Texas Instruments, Dallas, TX, USA
Abstract :
An integrated sensor system for conductive layer deposition process control is presented. The process equipment employs a multizone illuminator and noninvasive sensors for dynamic process uniformity control, real-time process and end-pointing, and process diagnosis. Various modes of sensor fusion have been implemented for improved equipment/process performance. Several noninvasive in situ sensors developed and integrated in a rapid thermal chemical-vapor-deposition (CVD) system for CVD tungsten (CVD-W) process control and diagnosis are presented.<>
Keywords :
VLSI; chemical vapour deposition; detectors; integrated circuit manufacture; process control; tungsten; ULSI manufacturing; W; conductive layer deposition; dynamic process uniformity control; integrated sensor system; multizone illuminator; noninvasive sensors; process control; process diagnosis; rapid thermal chemical-vapor-deposition; Chemical processes; Chemical sensors; Chemical vapor deposition; Manufacturing processes; Process control; Rapid thermal processing; Sensor fusion; Sensor systems; Thermal sensors; Ultra large scale integration;
Conference_Titel :
VLSI Technology, 1992. Digest of Technical Papers. 1992 Symposium on
Conference_Location :
Seattle, WA, USA
Print_ISBN :
0-7803-0698-8
DOI :
10.1109/VLSIT.1992.200641
