A new targets matching method based on epipolar geometry

In this paper, a multi-targets matching method to the epipolar line is proposed. The method, which is combined with a bundle of adjustment processes, is based on the epipolar plane, as opposed to method which is based on the 2D intersection of the epipolar line. During the procedure, the photogrammetric network is refined and strengthened as matching targets are gradually identified and introduced. An epipolar plane is defined such that the cause of such ambiguities can be eliminated by restricting the viewpoints used in the matching process. The new method has been found to be valid in the general case, and appears particularly suited to accurate industrial measurement.