DocumentCode :
3042764
Title :
Effects of annealing cycles on the electrical and morphological characteristics of Pd/Sn ohmic contacts to n-GaAs
Author :
Islam, M.S. ; McNally, Patrick J. ; Cameron, D.C. ; Herbert, P.A.F.
Author_Institution :
Sch. of Electron. Eng., Dublin City Univ., Ireland
Volume :
3
fYear :
1996
fDate :
13-16 May 1996
Firstpage :
1294
Abstract :
A novel Pd/Sn ohmic contact system is investigated for n-GaAs. The effects of annealing cycles on the electrical and morphological characteristics of the contacts are investigated using Scanning Electron Microscopy (SEM), surface profilometry measurements, Secondary Ion Mass Spectrometry (SIMS) and current-voltage (I-V) measurements. SEM and surface profilometry measurements are employed to investigate the surface morphology of the contacts. Contact depth profiles are analyzed by SIMS. Contact resistivities, pc, of the proposed metallization are measured utilizing a conventional Transmission Line Model (TLM) method. Annealing cycles show a significant effect on contact properties. Annealing at 360°C for 30 min yielded the lowest pc of ~3.26×10-5 Ω-cm2 with Pd(30 nm)/Sn(150 nm) contacts. Two-step annealing improves both electrical and morphological characteristics of Pd/Sn contacts. A lowest pc of ~1.49×10-5 Ω-cm2 is obtained with same contacts under two-step annealing (225°C, 50 s+350°C, 15 min) condition. The SIMS depth profiles of the contacts are nearly identical for both types of annealing
Keywords :
III-V semiconductors; annealing; contact resistance; gallium arsenide; ohmic contacts; palladium; scanning electron microscopy; secondary ion mass spectra; semiconductor device metallisation; semiconductor-metal boundaries; surface structure; tin; 15 min; 225 C; 30 min; 350 C; 360 C; 50 s; I-V measurements; Pd-Sn-GaAs; Pd/Sn ohmic contacts; SEM; SIMS; TLM method; annealing cycles; contact depth profiles; contact resistivities; current-voltage measurements; electrical characteristics; metallization; morphological characteristics; n-GaAs; n-type; scanning electron microscopy; secondary ion mass spectrometry; surface morphology; surface profilometry measurements; transmission line model method; two-step annealing; Annealing; Conductivity; Current measurement; Electric variables measurement; Mass spectroscopy; Ohmic contacts; Scanning electron microscopy; Surface morphology; Tin; Transmission line measurements;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrotechnical Conference, 1996. MELECON '96., 8th Mediterranean
Conference_Location :
Bari
Print_ISBN :
0-7803-3109-5
Type :
conf
DOI :
10.1109/MELCON.1996.551183
Filename :
551183
Link To Document :
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