Title :
A Proposed Nanofabrication Technique Using Optical Masks for Metastable Atom Lithography
Author :
Baker, M. ; Palmer, A.J. ; Sang, R.T.
Author_Institution :
Centre for Quantum Dynamics, Griffith Univ., Nathan, Qld.
Abstract :
We present an overview of our progress towards using optical fields as ´light masks´ for metastable atomic beam lithography. Numerical simulations have been undertaken to model the interaction of a beam of metastable neon atoms with a standing wave of 640.2 nm laser light. The current experimental setup and the proposed scheme for focusing the atoms is detailed
Keywords :
atom optics; atom-photon collisions; atomic beams; masks; metastable states; nanolithography; neon; 640.2 nm; Ne; atom beam-standing wave interaction; atom focusing; atom optics; atomic beam lithography; light masks; metastable lithography; metastable neon atoms; nanofabrication; optical fields; optical masks; Atom lasers; Atom optics; Atomic beams; Atomic layer deposition; Laser beams; Laser transitions; Lithography; Metastasis; Nanofabrication; Optical saturation; atom lithography; atom optics; nanofabrication;
Conference_Titel :
Optoelectronic and Microelectronic Materials and Devices, 2004 Conference on
Conference_Location :
Brisbane, Qld.
Print_ISBN :
0-7803-8820-8
DOI :
10.1109/COMMAD.2004.1577560
