• DocumentCode
    3043449
  • Title

    Research of etching a novel MEMS gyroscope sensing pendulum

  • Author

    Liu, Yu ; Sun, Baisheng ; Zhang, Fuxue ; Zhang, Wei

  • Author_Institution
    Sch. of Autom., Beijing Univ. of Posts & Telecommun., Beijing, China
  • fYear
    2010
  • fDate
    20-23 June 2010
  • Firstpage
    1516
  • Lastpage
    1519
  • Abstract
    A novel MEMS gyroscope sensing pendulum was etched with KOH by isothermal magnetic stirrer, and the etching rate relation with temperature and concentration was investigated in the mask of SiO2. The results reveal that a rate of etching Si(100), Si(100) to SiO2 and Si(100) to Si(111) is 4.0 μm/min, 550:1 and 90:1 respectively, a uniformity etching surface and ideal etching rate are obtained for a concentration of 30%KOH at 110°C, meet the production of MEMS gyroscope requirements.
  • Keywords
    etching; gyroscopes; micromechanical devices; pendulums; KOH; MEMS gyroscope sensing pendulum; ideal etching rate; isothermal magnetic stirrer; uniformity etching surface; Anisotropic magnetoresistance; Gyroscopes; Lithography; Magnetic anisotropy; Micromechanical devices; Oxidation; Perpendicular magnetic anisotropy; Silicon; Structural beams; Wet etching; KOH; MEMS; Magnetic; Wet Etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Information and Automation (ICIA), 2010 IEEE International Conference on
  • Conference_Location
    Harbin
  • Print_ISBN
    978-1-4244-5701-4
  • Type

    conf

  • DOI
    10.1109/ICINFA.2010.5512026
  • Filename
    5512026
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3043449