Title :
Humidify effect on non-thermal plasma processing for VOCs decomposition
Author :
Yamashita, Ryuuichi ; Takahashi, Tadashi ; Oda, Tetsuji
Author_Institution :
Dept. of Electr. Eng., Tokyo Univ., Japan
Abstract :
Humidity effects on surface discharges induced in nonthermal plasma processing for volatile organic compounds (VOCs) decomposition was studied extensively, because reactive OH radicals generated in the plasma are assumed to decompose dilute VOCs contaminated in air. The humidity of sample air contaminated with 1000 ppm CFC-113 was controlled with water bubbling where the water temperatures were 7°C, 17°C, 45°C and 70°C. The decomposition efficiency of CFC-113 was a little better in the dry air case. The decomposition efficiency of trichloroethylene was not affected by humidity
Keywords :
air pollution control; decomposition; humidity; organic compounds; plasma applications; surface discharges; 17 C; 45 C; 7 C; 70 C; CFC-113; air pollution treatment; decomposition efficiency; humidity effects; nonthermal plasma processing; reactive OH radicals; surface discharges; trichloroethylene; volatile organic compounds decomposition; water bubbling; Electron tubes; Humidity; Inductors; Plasma chemistry; Plasma materials processing; Plasma temperature; Surface contamination; Surface discharges; Testing; Water pollution;
Conference_Titel :
Industry Applications Conference, 1996. Thirty-First IAS Annual Meeting, IAS '96., Conference Record of the 1996 IEEE
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-3544-9
DOI :
10.1109/IAS.1996.559316
