DocumentCode :
3044177
Title :
Statistical averaging based linearity optimization for resistor string DAC architectures in nanoscale processes
Author :
Kosakowski, Martin ; Wittmann, Reimund ; Schardein, Werner
Author_Institution :
Nokia Res. Center, Bochum
fYear :
2008
fDate :
17-20 Sept. 2008
Firstpage :
261
Lastpage :
266
Abstract :
Behavioural modelling and yield optimization of resistor string based (potentiometer) digital-to-analog-converters (DACs) is presented to improve its reliability and area efficiency with focus on nonideal nanoscale CMOS processes, which suffer from large device tolerances. The optimization potential in terms of yield is analyzed taking systematic and statistical properties into account. Measurements of 4096-step and 16384-step DACs using 65 nm and 180 nm CMOS process show outstanding accuracy performance and excellent matching to simulated circuit performance using the behavioural model. Guidelines for efficient resistor string based DAC-design are presented.
Keywords :
CMOS integrated circuits; circuit reliability; digital-analogue conversion; logic design; statistical analysis; DAC architectures; device tolerances; digital-to-analog-converters; nanoscale CMOS processes; resistor string based DAC-design; size 180 nm; size 65 nm; statistical averaging based linearity optimization; CMOS process; CMOS technology; Guidelines; Linearity; Mathematical model; Nanoscale devices; Potentiometers; Resistors; Semiconductor device modeling; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOC Conference, 2008 IEEE International
Conference_Location :
Newport Beach, CA
Print_ISBN :
978-1-4244-2596-9
Electronic_ISBN :
978-1-4244-2597-6
Type :
conf
DOI :
10.1109/SOCC.2008.4641524
Filename :
4641524
Link To Document :
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