• DocumentCode
    3044270
  • Title

    An All Polymer Air-Flow Sensor Array using a Piezoresistive Composite Elastomer

  • Author

    Aiyar, A.R. ; Song, C. ; Kim, S.H. ; Allen, M.G.

  • Author_Institution
    Georgia Inst. of Technol., Atlanta, GA
  • fYear
    2009
  • fDate
    25-29 Jan. 2009
  • Firstpage
    447
  • Lastpage
    450
  • Abstract
    This paper presents an out-of-plane micromachined piezoresistive flow sensor array based on laser micromachining of polymer films, microstencil printing, and stress-engineered curvature. The developed process is suitable for low cost, large-area sensor array fabrication, and can leverage traditional flex-circuit fabrication. Each device is composed of an out-of-plane curved microtuft formed from laser-machined Kaptonreg polyimide and PECVD-deposited SiO2, and a conductive elastomer piezoresistor with a measured gage factor of 7.3 located at the base of the microtuft. The fabrication and performance of a prototype array and a fabrication sequence for large-area arrays on flexible substrates is demonstrated, for flow field mapping across an airfoil. The fabrication sequence also enables backside interconnects without adding further process complexity, which facilitates integration and enables the sensing of airflow with minimum interference due to the sensing circuitry. Individual microtufts as small as 1.5 mm in length and 0.4 mm in width, with 70 m wide piezoresistor lines have been fabricated. Wind tunnel testing demonstrated sensitivities as high as 66 Omega/(m/s).
  • Keywords
    chemical vapour deposition; composite materials; elastomers; flow sensors; laser beam machining; micromachining; microsensors; piezoresistive devices; resistors; sensor arrays; substrates; thin films; PECVD; SiO2; airfoil; all polymer air-flow sensor array; conductive elastomer piezoresistor; flex-circuit fabrication; flexible substrates; gage factor; laser micromachining; microstencil printing; microtuft; out-of-plane micromachined flow sensor array; piezoresistive composite elastomer; piezoresistor lines fabrication; polymer films; size 0.4 mm; size 1.5 mm; size 70 m; stress-engineered curvature; wind tunnel testing; Costs; Micromachining; Optical arrays; Optical device fabrication; Piezoresistance; Piezoresistive devices; Polyimides; Polymer films; Printing; Sensor arrays;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2009. MEMS 2009. IEEE 22nd International Conference on
  • Conference_Location
    Sorrento
  • ISSN
    1084-6999
  • Print_ISBN
    978-1-4244-2977-6
  • Electronic_ISBN
    1084-6999
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2009.4805415
  • Filename
    4805415