Title :
Degradation of Mechanical Strength at Si/SiO2 Interface on SOI Wafers under Cyclic Loading
Author :
Ando, T. ; Takumi, T. ; Sato, K.
Author_Institution :
Dept. of Micro-Nano Syst. Eng., Nagoya Univ., Nagoya
Abstract :
Fatigue tests of silicon stepped cantilevers fabricated from silicon on insulator (SOI) wafers were conducted under the bending mode to evaluate the effect of cyclic loading on fractures occurring in silicon and Si/SiO2 interfaces. The specimen in the quasi-static mode fractured at the stress concentration site on the silicon specimens. However, during the fatigue tests the cantilever broke after 104 cycles with stress amplitude of nearly half of the bending strength at the fixed end comprising the Si/SiO2 interface. The results demonstrated that the cyclic stress durability in the Si/SiO2 interface is significantly lower than that of the silicon body.
Keywords :
bending strength; fatigue testing; mechanical strength; silicon compounds; silicon-on-insulator; stress analysis; SOI wafers; bending mode; cyclic loading; cyclic stress durability; fatigue tests; mechanical strength degradation; silicon on insulator; silicon stepped cantilevers; stress amplitude; Degradation; Etching; Fabrication; Fatigue; Micromachining; Silicon compounds; Silicon on insulator technology; Stress; Systems engineering and theory; Testing;
Conference_Titel :
Micro Electro Mechanical Systems, 2009. MEMS 2009. IEEE 22nd International Conference on
Conference_Location :
Sorrento
Print_ISBN :
978-1-4244-2977-6
Electronic_ISBN :
1084-6999
DOI :
10.1109/MEMSYS.2009.4805470