DocumentCode :
3045298
Title :
Low Temperature Fabrication Process for High-Aspect-Ratio and Multi-Compliant MEMS
Author :
Kühne, S. ; Blattmann, R. ; Hierold, Ch
Author_Institution :
Dept. of Mech. & Process Eng., ETH Zurich, Zurich
fYear :
2009
fDate :
25-29 Jan. 2009
Firstpage :
673
Lastpage :
676
Abstract :
The presented process technology enables the fabrication of 3D high-aspect-ratio microstructures featuring the integration of multiple materials. The technology offers the possibility to benefit from unique material properties for optimized MEMS functionality and performance. The fabrication process relies on wafer stacking by low temperature plasma activated direct bonding, SOI layer transfer and SU-8 structuring. The proposed process flow is validated by the fabrication of micro mirrors featuring a soft polymeric suspension and a high-aspect-ratio vertical comb-drive actuator. The devices are characterized and confirm the expected performance with dynamic resonant optical deflection angles of 59deg at 50V.
Keywords :
micromechanical devices; micromirrors; wafer bonding; MEMS functionality; MEMS performance; SOI layer transfer; SU-8 structuring; high-aspect-ratio MEMS; low temperature fabrication; low temperature plasma activated direct bonding; material property; micromirror; microstructure; multicompliant MEMS; soft polymeric suspension; wafer stacking; Fabrication; Material properties; Micromechanical devices; Microstructure; Plasma devices; Plasma materials processing; Plasma properties; Plasma temperature; Stacking; Wafer bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 2009. MEMS 2009. IEEE 22nd International Conference on
Conference_Location :
Sorrento
ISSN :
1084-6999
Print_ISBN :
978-1-4244-2977-6
Electronic_ISBN :
1084-6999
Type :
conf
DOI :
10.1109/MEMSYS.2009.4805472
Filename :
4805472
Link To Document :
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