Title :
Measurement Results of the First Two Chip Silicon Microphone with Low Stress Nickel Membrane Covering Full Audio Range
Author :
Junge, S. ; Jakobs, F. ; Lang, W.
Author_Institution :
Inst. for Mikrosensors, -actuators & -Syst. (IMS AS), Univ. of Bremen, Bremen
Abstract :
This paper provides an overview of the development, fabrication and measurement results of a new type of silicon microphone. It mainly consists of a low stress nickel membrane with a nonlinear frequency response and a gold backplate electrode. The microphone can be used as condenser or electret microphone. A sensitivity of -64 dBV/Pa at 52 V bias was obtained with an air gap of 20 mum and membrane resonance at 20 kHz.
Keywords :
microfabrication; microphones; silicon; frequency 20 kHz; full audio range; gold backplate electrode; low stress nickel membrane; membrane resonance; nonlinear frequency response; two chip silicon microphone; voltage 52 V; Biomembranes; Electrodes; Fabrication; Frequency response; Gold; Microphones; Nickel; Semiconductor device measurement; Silicon; Stress measurement;
Conference_Titel :
Micro Electro Mechanical Systems, 2009. MEMS 2009. IEEE 22nd International Conference on
Conference_Location :
Sorrento
Print_ISBN :
978-1-4244-2977-6
Electronic_ISBN :
1084-6999
DOI :
10.1109/MEMSYS.2009.4805498
