Title :
Tuning the spectral sensitivity of vertical InN nanopyramid based photodetectors by means of band gap engineering and/or nanostructure size control
Author :
Trellenkamp, Stefan ; Mikulics, M. ; Winden, A. ; Adam, R. ; Moers, J. ; Marso, M. ; Grutzmacher, D. ; Hardtdegen, H.
Author_Institution :
Peter Grunberg Inst. (PGI-9), Forschungszentrum Julich, Julich, Germany
Abstract :
We fabricated and tested InN nanopyramid based photodetectors designed for operation in the telecommunication-wavelength range. We found that the spectral sensitivity of InN photodetectors can be engineered by their size and by the strain interaction with the masked SiO2/GaN substrates. The band edge luminescence energy of the InN nanopyramids depends linearly on the structure size. Furthermore, InN nanopyramid based photodetectors exhibit a low device RC constant, low dark currents below 1 nA, as well as a responsivity of ~ 0.2 A/W at 1550 nm wavelength. InN nanopyramid based photodetectors are very promising candidates for high-speed optoelectronics within the telecommunication wavelength range.
Keywords :
III-V semiconductors; dark conductivity; indium compounds; luminescence; nanofabrication; nanosensors; nanostructured materials; photodetectors; wide band gap semiconductors; InN; SiO2-GaN; band edge luminescence energy; band gap engineering; dark currents; device RC constant; high-speed optoelectronics; masked silica-GaN substrates; nanostructure size control; responsivity; spectral sensitivity; strain interaction; telecommunication-wavelength; vertical InN nanopyramid based photodetectors; wavelength 1550 nm; Apertures; Fabrication; Nanoscale devices; Photodetectors; Photonic band gap; Sensitivity; Strain;
Conference_Titel :
Advanced Semiconductor Devices & Microsystems (ASDAM), 2012 Ninth International Conference on
Conference_Location :
Smolenice
Print_ISBN :
978-1-4673-1197-7
DOI :
10.1109/ASDAM.2012.6418527