Title :
Latest results from the hyper - NA immersion scanners
Author_Institution :
Nikon Corp., Saitama
Abstract :
Intensive immersion scanner development has enabled resolution of the main technical challenges that had been considered potential show-stoppers for immersion lithography. Leading-edge immersion scanners, such as the Nikon NSR-S610C, deliver not only the 1.30 numerical aperture required for 45 nm half-pitch production, but also provide overlay accuracy, defectivity comparable to dry exposure tools.
Keywords :
immersion lithography; 45 nm half-pitch production; Intensive immersion scanner; Nikon NSR-S610C; hyper - NA immersion scanners; immersion lithography; numerical aperture; overlay accuracy; Apertures; Cooling; High-resolution imaging; Lenses; Lithography; Mass production; Polarization; Pollution measurement; Resists; Space technology;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456081
