Title :
Three-dimensional Nanomechanical Device Fabrication by FIB-CVD
Author_Institution :
Hyogo Univ., Hyogo
Abstract :
Three-dimensional nanostructure fabrication has been demonstrated by 30 keV Ga+ FIB-CVD using a phenanthrene (C14H10) source as a precursor. The characterization of deposited film on a silicon substrate was performed by a transmission microscope and Raman spectra. This result indicates that the deposition film is a diamondlike amorphous carbon (DLC) which have attractive attention because of their hardness, chemical inertness and optical transparency. A large Young´s modulus that exceeds 600 GPa seems to present great possibilities for various applications. These results demonstrate that FIB-CVD is one of key technologies to make 3D nanostructure devices in the field of electronics, mechanics, optics and biology.
Keywords :
Raman spectra; Young´s modulus; chemical vapour deposition; diamond-like carbon; focused ion beam technology; hardness; nanoelectronics; nanostructured materials; nanotechnology; thin films; 3D nanomechanical device fabrication; C; DLC; FIB-CVD; Raman spectra; Si; Young´s modulus; biology; chemical inertness; diamondlike amorphous carbon; electronics; hardness; mechanics; nanostructured material fabrication; optical transparency; optics; phenanthrene; transmission microscopy; Amorphous materials; Biomedical optical imaging; Fabrication; Microscopy; Nanobioscience; Nanoscale devices; Optical films; Semiconductor films; Silicon; Substrates;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456083
