DocumentCode
3047451
Title
Development status of Nikon EUV exposure tools
Author
Murakami, Katsuhiko
Author_Institution
Nikon Corp., Sagamihara
fYear
2007
fDate
5-8 Nov. 2007
Firstpage
24
Lastpage
24
Abstract
Extreme ultra violet lithography (EUVL) is widely regarded as the lithography technology to succeed optical lithography. In this paper, updated development status of Nikon´s EUVL process development tool named EUV1 is presented.
Keywords
ultraviolet lithography; Nikon´s EUVL process; extreme ultraviolet lithography; optical lithography; Light sources; Lighting; Lithography; Metrology; Mirrors; Optical interferometry; Optical surface waves; Stimulated emission; Surface waves; Ultraviolet sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location
Kyoto
Print_ISBN
978-4-9902472-4-9
Type
conf
DOI
10.1109/IMNC.2007.4456086
Filename
4456086
Link To Document