Title :
Development status of Nikon EUV exposure tools
Author :
Murakami, Katsuhiko
Author_Institution :
Nikon Corp., Sagamihara
Abstract :
Extreme ultra violet lithography (EUVL) is widely regarded as the lithography technology to succeed optical lithography. In this paper, updated development status of Nikon´s EUVL process development tool named EUV1 is presented.
Keywords :
ultraviolet lithography; Nikon´s EUVL process; extreme ultraviolet lithography; optical lithography; Light sources; Lighting; Lithography; Metrology; Mirrors; Optical interferometry; Optical surface waves; Stimulated emission; Surface waves; Ultraviolet sources;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456086
