Title :
Canon´s Development Status of EUVL Technologies
Author :
Hasegawa, Takayuki ; Uzawa, Shigeyuki ; Kubo, Hiroyoshi ; Tsuji, Toshihiko
Abstract :
Canon has been developing the EUVL technologies for more than ten years. The current development status of EUVL technologies is presented. The small field exposure tool (SFET) is positioned as a cornerstone of the manufacturing technologies for the EUVL beta tool. LPP source and the DPP source are the most expecting methods for the EUVL beta tools.
Keywords :
discharges (electric); plasma production by laser; ultraviolet lithography; ultraviolet sources; Canon´s development status; DPP source; EUVL technologies; LPP source; SFET; discharge produced plasma source; laser produced plasma source; small field exposure tool; Collaborative tools; Collaborative work; Manufacturing; Optical imaging; Optical sensors; Optical surface waves; Resists; System performance; Testing; Ultraviolet sources;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456087
