Results from Alpha Demo and an update on the realization of EUV lithography

EUV Lithography is targeted for use for sub 40 nm critical level imaging, and the Alpha Demo Tools developed by ASML will be used to help manage the technological risks involved in readying this technology for commercialization. Our work on EUVL has included the design and implementation of key lithography system modules, creating those that are unique to EUVL and combining them with others that build on TWINSCANtrade technology. This work has involved vacuum technology, defect free mask handling, tin plasma sources, all reflective optical systems, and optical system contamination control. In this presentation, we will focus on results from integrating and testing the two Alpha Demo tools. These tools are critical in supporting the development of the global EUV infrastructure, and we will report on key aspects of EUV masks and resist as these relate to the work that has been done. The two Alpha Demo Tools will be used in research centers by ASML, our co-developers, and our customers, and will be critical for enabling the commercialization of EUV Lithography.