DocumentCode :
3047510
Title :
Development of a LPP EUV light source for below-32nm Node Lithography
Author :
Brandt, David ; Oga, T. ; Farrar, N. ; Bonafede, James
fYear :
2007
fDate :
5-8 Nov. 2007
Firstpage :
32
Lastpage :
33
Abstract :
A comprehensive review of the development activities being undertaken at Cymer in the development of a CO2 laser produced plasma (LPP) light source for EUV lithography is provided. A new and effective debris mitigation technique which greatly reduces the Ion Flux generated during exposure is also demonstrated.
Keywords :
plasma production by laser; ultraviolet lithography; ultraviolet sources; CO2 laser produced plasma; EUV lithography; debris mitigation technique; ion flux; light source; Coatings; Light sources; Lithography; Mirrors; Optical control; Plasma sources; Power lasers; Prototypes; Scalability; Ultraviolet sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
Type :
conf
DOI :
10.1109/IMNC.2007.4456090
Filename :
4456090
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3047510
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