Title :
Dual grating interferometric lithography for 22-nm node
Author :
Shiotani, H. ; Suzuki, Satoshi ; Dong Gun Lee ; Naulleau, P.
Author_Institution :
Hyogo Univ., Ako
Abstract :
Dual grating interferometric (DGI) lithography which can be operate in the usage of an incoherent EUV light source is proposed. Thus, the DGI exposure method can combine with a stand alone EUV source, such as laser produced plasma and discharge produced plasma. Therefore, this exposure system becomes a compact one for the evaluation of resolution and LER in a EUV resist.
Keywords :
diffraction gratings; discharges (electric); nanolithography; plasma production by laser; ultraviolet lithography; ultraviolet sources; DGI; diffraction gratings; discharge produced plasma; dual grating interferometric lithography; incoherent EUV light source; laser produced plasma; resist; Diffraction gratings; Interference; Interferometric lithography; Light sources; Optical interferometry; Optical sensors; Plasma applications; Plasma sources; Resists; Ultraviolet sources;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456097
