Title :
Novel Method for Measurement Condition Optimization in CD-SEM
Author :
Hitomi, Kentarou ; Nakayama, Yoshinori ; Yamanashi, Hiromasa ; Sohda, Yasunari ; Kawada, Hiroki
Author_Institution :
Hitachi, Ltd., Kokubunji
Abstract :
This paper introduces the Taguchi method for the optimization of measurement conditions in critical dimension-scanning electron microscope (CD-SEM). As a result, four parameter conditions are optimized for low resist shrinkage and highly precise measurement through eighteen experiments. The prediction accuracy is under 0.2 nm. Moreover, high prediction accuracy is obtained for three different ArF resists. Therefore, it is clarified that the proposed method is a promising tool for CD-measurement optimization.
Keywords :
Taguchi methods; resists; scanning electron microscopy; ArF; ArF resists; Taguchi method; critical dimension-scanning electron microscope; low resist shrinkage; measurement condition optimization; precise measurement; prediction accuracy; Acceleration; Accuracy; Electron beams; Electron microscopy; Fabrication; Lithography; Optimization methods; Probes; Resists; Scanning electron microscopy;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456100
