Title :
Estimation of resist blur by overlay measurement
Author :
Nakao, Shuji ; Maejima, Shinroku ; Hagiwara, Takuya ; Moniwa, Akemi ; Sakai, Junjiro ; Hanawa, Tetsuro ; Suko, Kazuyuki
Author_Institution :
Renesas Technol., Itami
Abstract :
A method to estimate a magnitude of resist blur by overlay measurement with a special mark. Because of utilization of optical measurement, line-end-shortening (LES) can be measured with good repeatability, resulting in accurate estimation of a magnitude of resist blur. This method is very useful to estimate resist blur in an advanced lithography era.
Keywords :
optical instruments; photoresists; line-end-shortening; lithography; optical measurement; overlay measurement; resist blur; Chemical compounds; Chemical technology; Convolution; Image resolution; Lithography; Optical films; Optical sensors; Resists; Shape; Stability;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456101
