Analysis of Electron Beam Sensitivity of Self-Assembled Monolayer Resist Depending on Terminal Group

Organosilane self-assembled monolayers (SAMs) have been utilized as one of the candidate for electron beam (EB) resist. Hydroxy-terminated SAM is much more sensitive to EB than vinyl-terminated one. This indicates that the sensitivity of SAMs to EB changes significantly depending on their type of terminal groups. However, the reason why the type of the terminal groups makes a difference of EB sensitivity is not understood yet. To clarify this reason, the effect of EB irradiation on SAMs by using infrared spectroscopy (IR), X-ray photoelectron spectroscopy (XPS), ellipsometry and contact angle measurement are discussed.