DocumentCode :
3047905
Title :
Relaxation of low-frequency noise in AlGaN/GaN HEMTs
Author :
Satka, Alexander ; Rendek, K. ; Priesol, J.
Author_Institution :
Inst. of Electron. & Photonics, Slovak Univ. of Technol., Bratislava, Slovakia
fYear :
2012
fDate :
11-15 Nov. 2012
Firstpage :
199
Lastpage :
202
Abstract :
In this contribution we report on low-frequency (LF) noise spectra of aluminium gallium nitride / gallium nitride (AlGaN/GaN) high electron mobility transistors (HEMTs) subjected to the illumination by photons of energy Eph bellow the energy band gap Eg of GaN. Change of LF noise spectra of the drain voltage noise and the gate current noise during the illumination and its slow relaxation to initial value after the illumination termination during the first 10 minute interval have been observed. These changes were related to time dependent changes of operating parameters (VDS, IDS and IGS) and discussed in terms of the traps located in AlGaN/GaN HEMT structure.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; relaxation; semiconductor device noise; wide band gap semiconductors; AlGaN-GaN; GaN energy band gap; aluminium gallium nitride-gallium nitride high electron mobility transistor structure; drain voltage noise; gate current noise; illumination termination; low-frequency noise relaxation; low-frequency noise spectra; operating parameters; slow relaxation; time 10 min; time dependent changes; Gallium nitride; HEMTs; Lighting; Logic gates; Low-frequency noise; MODFETs;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Devices & Microsystems (ASDAM), 2012 Ninth International Conference on
Conference_Location :
Smolenice
Print_ISBN :
978-1-4673-1197-7
Type :
conf
DOI :
10.1109/ASDAM.2012.6418568
Filename :
6418568
Link To Document :
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