• DocumentCode
    3047983
  • Title

    DC characterization of InGaAs/InAlAs/InP based pseudomorphic HEMT (pHEMT)

  • Author

    Ahmad, Mohiuddin ; Butt, H.T. ; Tauqeer, Tauseef ; Missous, Mohamed

  • Author_Institution
    Sch. of Electr. Eng. & Comput. Sci. (SEECS), Nat. Univ. of Sci. & Technol., Islamabad, Pakistan
  • fYear
    2012
  • fDate
    11-15 Nov. 2012
  • Firstpage
    187
  • Lastpage
    190
  • Abstract
    An epitaxial structure comprising depletion mode In0.7Ga0.3As/In0.52Al0.48As/InP pHEMT has been simulated using SILVACO. The main objective of our work was to incorporate a highly strained pseudomorphic In0.7Ga0.3As channel layer and study the effects of variations of supply layer thicknesses, delta doping and gate length. The important DC parameters such as pinch-off voltage, maximum drain current and transconductance are extracted from these simulations which suggest that our device architecture and material exhibits optimized performance. This research also focuses on inverse device modelling from experimental data and proposes calibration changes in epitaxial structure, geometry and doping of simulated pHEMT device in order to match simulated results with the measured results.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor device models; semiconductor doping; semiconductor epitaxial layers; DC characterization; DC parameters; In0.7Ga0.3As-In0.52Al0.48As-InP; InGaAs-InAlAs-InP based pseudomorphic HEMT; SILVACO; delta doping; depletion mode pseudomorphic HEMT; device architecture; epitaxial structure; gate length; highly strained pseudomorphic channel layer; inverse device modelling; maximum drain current; optimized performance; pinch-off voltage; pseudomorphic HEMT device; supply layer thicknesses; transconductance; Doping; Indium gallium arsenide; Indium phosphide; Logic gates; PHEMTs; Semiconductor process modeling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Devices & Microsystems (ASDAM), 2012 Ninth International Conference on
  • Conference_Location
    Smolenice
  • Print_ISBN
    978-1-4673-1197-7
  • Type

    conf

  • DOI
    10.1109/ASDAM.2012.6418571
  • Filename
    6418571